Olympus BX51M Reflected light microscope

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$4.999,00

Olympus BX51M reflected light microscope with polarization and DIC

  • Model BX51RF
  • Trinocular phototube U-TR30-2
  • Oculars WHN10X-H/22 & WHN10x/22
  • Revolving nosepiece U-D6RE 6-position with the following objectives:
  • UMPlanFL 5x/0.15, WD: 20mm
  • LMPlanFL 10x/0.25, WD: 11mm
  • DIC slider U-DICR
  • Analyzer U-AN
  • Polarizer U-PO3
  • Reflected light illuminator U-LH100-3 (12V 100W)
SKU: MLS-00230 Category: Tag: Brand:

The Olympus BX51M is an advanced, upright reflected light microscope engineered specifically for materials science, metallurgy, semiconductor inspection, and industrial quality control. Known for its robust modularity and exceptional optical clarity, it serves as a versatile platform for inspecting opaque specimens.

Product Features Olympus BX51M :

  • UIS Infinity Optics: Built on Olympus’s Universal Infinity System (UIS), the microscope delivers high-resolution, distortion-free images with superior contrast across all magnification levels.

  • Versatile Illumination Options: Features an arm-integrated reflected light illuminator that supports halogen, metal halide, xenon, or mercury lamp housings. This allows users to switch between high-intensity white light and specialized illumination needs.

  • Multiple Observation Methods: Accommodates a wide array of inspection techniques including brightfield (BF), darkfield (DF), polarized light (POL), fluorescence, and Nomarski Differential Interference Contrast (DIC).

  • Long Working Distance Objectives: Utilizes specialized objective series (such as M Plan and LM Plan Fluorite) offering extended working distances to protect delicate or high-topography samples from physical contact.

  • Modular Design & Ergonomics: Features an ergonomic Y-shape frame design with logical controls. It supports interchangeable observation tubes (such as trinocular heads for digital camera integration), revolving nosepieces, and specialized mechanical stages.

Specifications Olympus BX51M:

Category Key Specifications & Features
Optical System UIS / UIS2 (Universal Infinity System)
Field of View Standard F.N. 22 (expandable up to F.N. 26.5 for super-widefield)
Magnification Range 25x – 1500x+ (depending on eyepiece and objective lens combination)
Observation Methods Brightfield (BF), Darkfield (DF), Polarized Light (POL), Differential Interference Contrast (DIC/Nomarski), and Epi-Fluorescence
Illuminators

• BX-RLA2: For BF / DF / DIC / POL

 

• BX-URA2: Universal illuminator with multi-position filter cube cassette for Fluorescence

Light Source

• Standard: 12V 100W Halogen (U-LH100-3 housing)

 

• Optional: 100W Mercury, 75W Xenon, Metal Halide, or LED conversion systems

Filters & Diaphragms Field iris diaphragm, aperture iris diaphragm, and 45 mm filter slots (ND6, ND25, LBD daylight, green/yellow)
Objective Options

• M Plan / UM Plan FL (Brightfield): 5x, 10x, 20x, 50x, 100x

 

• MPLBD (Brightfield/Darkfield): 5x BD, 10x BD, 20x BD, 50x BD, 100x BD

 

• LM Plan FL / SLM Plan (Long Working Distance up to 21 mm)

Revolving Nosepiece Quintuple (5-position) or Sextuple (6-position) manual or motorized options
Focusing & Stage Mechanism

• Focus: Coaxial coarse & fine control (fine graduation: 1 µm per division, coarse stroke: 25 mm)

 

• Stage: Ceramic-coated mechanical stage (stroke from standard 76 x 50 mm up to 100 x 100 mm / 4″ x 4″)

Observation Tubes Binocular, Ergonomic Tilting Binocular/Trinocular, or Trinocular (e.g., U-TR30 / U-SWTR-3 with 3-position beam splitter: 100:0, 20:80, 0:100 for digital camera integration)
Frame & Rigidity Heavy-duty Y-shaped cast aluminum frame with ESD-safe options for cleanroom and semiconductor applications

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